Mader, Christoph; Bock, Robert; Müller, Jens; Schmidt, Jan; Brendel, Rolf
(Amsterdam : Elsevier BV, 2011)
Locally aluminum-doped p-type silicon regions are formed by in-line high-rate evaporation of aluminum. We deposit aluminum layers of 28 μm thickness at dynamic deposition rates of 20 μm×m/min on locally laser-ablated Al2O3 ...